Equipment available at IMM and used in the group's research:
Growth
| Combined MBE - Magnetron UHV deposition system Base pressure < 5. 10 -10 mbar. Load lock for quick sample entry. 6 DC-RF magnetrons. 1 knudsen cell. Electron beam evaporator with three crucibles. Sample temperature between RT and 800ºC. Posibility of connecting Cluster source from ICMM (Dr. Y.Huttel). |
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| Magnetron UHV sputtering system Base pressure < 5. 10 -10 mbar. Load lock for quick sample entry. Deposition of 5 different materials. DC and RF power supplies. Posibility of connecting Cluster source from ICMM (Dr. Y.Huttel). |
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Nanostructuration
| UV and high resolution electron beam lithography + etching facilities |  |
